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US Patent 6858112 Process depending on plasma discharges sustained by inductive coupling

Patent 6858112 was granted and assigned to Hitachi on February, 2005 by the United States Patent and Trademark Office.

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Patent abstract

A process for fabricating a product 28, 119. The process comprises the steps of subjecting a substrate to a composition of entities, at least one of the entities emanating from a species generated by a gaseous discharge excited by a high frequency field in which the vector sum of currents to phase and inverse-phase capacitive coupled voltages from the inductive coupling structure can be selectively maintained.

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