Is a
Patent attributes
Patent Applicant
0
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Andrew D. Bailey, III0
Mark H. Wilcoxson0
Date of Patent
March 29, 2005
0Patent Application Number
107791870
Date Filed
February 13, 2004
0Patent Citations Received
Patent Primary Examiner
Patent abstract
The invention provides a method, for processing a substrate. The substrate is placed in a chamber, where the chamber comprises a substrate holder within the chamber and a dielectric window forming a side of the chamber. A gas is provided into the chamber. An antenna is used to generate an azimuthally symmetric electric field. A substantially azimuthally symmetric plasma is formed from the gas using the azimuthally symmetric electric field. A substantially uniform process rate is produced across a surface of a substrate.
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