Is a
Patent attributes
Patent Applicant
0
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Daisuke Inomata0
Date of Patent
May 10, 2005
0Patent Application Number
103059530
Date Filed
November 29, 2002
0Patent Citations Received
Patent Primary Examiner
Patent abstract
Alignment marks of a semiconductor device, formed prior to a step of applying heat treatment in an oxygen atmosphere, include an insulating film, a groove formed in the insulating film during a step of defining a contactor hole in a device part, a metal film formed at least on sidewalls of the groove during a step of burying the contactor hole in the device part, and a cover film formed on the insulating film to cover the metal film formed in the groove for prevention of oxidation of the metal film during heat treatment applied in an oxygen atmosphere.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
