Is a
Patent attributes
Patent Applicant
0
Patent Jurisdiction
Patent Number
Patent Inventor Names
Craig Jon Hawker0
John Campbell Scott0
Kenneth Raymond Carter0
Mark Whitney Hart0
Date of Patent
May 31, 2005
0Patent Application Number
103013180
Date Filed
November 20, 2002
0Patent Citations Received
Patent Primary Examiner
Patent abstract
High density circuitry and metallic patterns are grown from polymer that has been patterned using a contact molding process. The patterned polymer is either intrinsically seedable or treated to make it seedable, e.g., it may be seeded with metallic seed ions, such as Pd ions. The patterned polymer is placed in an electroless deposition bath, with metal being plated onto its surface. Using these methods, metal (e.g, copper) may be deposited onto substrates of either organic or inorganic dielectric materials. The dielectric materials may comprise epoxy resins, ceramics, semiconductors (Si), glass, and silicon oxide.
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