Is a
Patent attributes
Patent Applicant
0
Patent Jurisdiction
Patent Number
Patent Inventor Names
Frank Alford0
Stephane Ferrasse0
Vladimir M. Segal0
Date of Patent
June 21, 2005
0Patent Application Number
101717140
Date Filed
June 12, 2002
0Patent Citations Received
Patent Primary Examiner
Patent abstract
The invention includes a physical vapor deposition target composed of a face centered cubic unit cell metal or alloy and having a uniform grain size less than 30 microns, preferably less than 1 micron; and a uniform axial or planar <220> texture. Also described is a method for making sputtering targets. The method can comprise billet preparation; equal channel angular extrusion with a prescribed route and number of passes; and cross-rolling or forging subsequent to the equal channel angular extrusion.
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