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US Patent 6920312 RF generating system with fast loop control

Patent 6920312 was granted and assigned to Lam Research on July, 2005 by the United States Patent and Trademark Office.

OverviewStructured DataIssuesContributors
Is a
Patent
Patent
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Current Assignee
Lam Research
Lam Research
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Date Filed
January 2, 2002
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Date of Patent
July 19, 2005
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Patent Application Number
10038133
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Patent Citations Received
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US Patent 12020902 Plasma processing with broadband RF waveforms
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US Patent 11978613 Transition control in a bias supply
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US Patent 12125674 Surface charge and power feedback and control using a switch mode bias system
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US Patent 11842884 Spatial monitoring and control of plasma processing environments
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US Patent 11887812 Bias supply with a single controlled switch
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US Patent 11942309 Bias supply with resonant switching
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Patent Inventor Names
Neil Benjamin
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
6920312
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Patent Primary Examiner
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Marceau Milord
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