Is a
Patent attributes
Patent Applicant
0
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Bret W. Adams0
Boguslaw A. Swedek0
David A. Chan0
Manoocher Birang0
Sanjay Rajaram0
Date of Patent
September 6, 2005
0Patent Application Number
103306870
Date Filed
December 27, 2002
0Patent Citations Received
Patent Primary Examiner
Patent abstract
A computer-implemented method for process control in chemical mechanical polishing in which an initial pre-polishing thickness of a substrate is measured at a metrology station, a parameter of an endpoint algorithm is determined from the initial thickness of the substrate, a substrates is polished at a polishing station, and polishing stops when an endpoint criterion is detected using the endpoint algorithm.
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