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US Patent 6972524 Plasma processing system control

Patent 6972524 was granted and assigned to Lam Research on December, 2005 by the United States Patent and Trademark Office.

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
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Current Assignee
Lam Research
Lam Research
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Date Filed
March 24, 2004
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Date of Patent
December 6, 2005
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Patent Application Number
10808795
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Patent Citations Received
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US Patent 12106938 Distortion current mitigation in a radio frequency plasma processing chamber
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US Patent 11967483 Plasma excitation with ion energy control
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US Patent 11972924 Pulsed voltage source for plasma processing applications
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US Patent 12125673 Pulsed voltage source for plasma processing applications
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US Patent 12111341 In-situ electric field detection method and apparatus
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US Patent 11887813 Pulsed voltage source for plasma processing
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US Patent 11908660 Systems and methods for optimizing power delivery to an electrode of a plasma chamber
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US Patent 11948780 Automatic electrostatic chuck bias compensation during plasma processing
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Patent Inventor Names
Alexei M. Marakhtanov
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Eric Allen Hudson
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S. M. Reza Sadjadi
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
6972524
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Patent Primary Examiner
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David Vu
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