Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Dennis Tebbe0
Thomas Smyth0
William Johnson Chappell0
Date of Patent
January 31, 2006
0Patent Application Number
111184450
Date Filed
April 29, 2005
0Patent Citations Received
Patent Primary Examiner
Patent abstract
A substrate (300) for an RF device includes a plurality of layers (102) of dielectric material cofired in a stack. The plurality of layers (102) is formed from a material having a permittivity. Selected ones of the layers (102) have a pattern of perforations (106) formed in at least one perforated area (104). The perforated areas (104) are generally aligned with one another in the stack to lower one or more of an effective value of a permittivity and a loss tangent in a least one spatially defined region (504) of the substrate (300).
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