Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Yukio Nishimura0
Kuang-Jung Chen0
Mahmoud H. Khojasteh0
Pushkara Rao Varanasi0
Eiichi Kobayashi0
Date of Patent
August 8, 2006
Patent Application Number
10261249
Date Filed
September 30, 2002
Patent Primary Examiner
Patent abstract
Acid-catalyzed positive resist compositions which are imageable with 193 nm radiation and/or possibly other radiation and are developable to form resist structures of improved development characteristics and improved etch resistance are enabled by the use of resist compositions containing imaging polymer component comprising an acid-sensitive polymer having a monomeric unit with a pendant group containing a remote acid labile moiety.
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