Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Yumiko Abe0
Hiroaki Tomimori0
Norio Ishikawa0
Takuo Oowada0
Hidemitsu Aoki0
Date of Patent
August 8, 2006
0Patent Application Number
104351650
Date Filed
May 9, 2003
0Patent Primary Examiner
Patent abstract
A post-CMP washing liquid composition is provided which includes one type or two or more types of aliphatic polycarboxylic acids and one type or two or more types selected from the group consisting of glyoxylic acid, ascorbic acid, glucose, fructose, lactose, and mannose, and which has a pH of less than 3.0. This washing liquid has excellent performance in removing micro particles and metal impurities adhering to the surface of a semiconductor substrate after CMP and does not corrode a metal wiring material.
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