Patent 7087973 was granted and assigned to Micrel on August, 2006 by the United States Patent and Trademark Office.
A transistor is formed with a source ballast resistor that regulates channel current. In an LDMOS transistor embodiment, the source ballast resistance may be formed using a high sheet resistance diffusion self aligned to the polysilicon gate, and/or by extending a depletion implant from under the polysilicon gate toward the source region. The teachings herein may be used to form effective ballast resistors for source and/or drain regions, and may be used in many types of transistors, including lateral and vertical transistors operating in a depletion or an enhancement mode, and BJT devices.