Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
August 15, 2006
Patent Application Number
09804158
Date Filed
March 13, 2001
Patent Primary Examiner
Patent abstract
In the formation of a halftone type phase shift mask, a reactive gas introduction inlet and an inert gas introduction inlet are provided so as to introduce the respective gases separately and by using a reactive low throw sputtering method a molybdenum silicide based phase shifter film is formed. Thereby, it becomes possible to provide a halftone type phase shift mask, which is applicable to an ArF laser or to a KrF laser, by using molybdenum silicide based materials.
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