Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Akira Ishikawa0
Date of Patent
August 22, 2006
0Patent Application Number
108180320
Date Filed
April 5, 2004
0Patent Primary Examiner
Patent abstract
Provided is a method of realizing a semiconductor device having a structure in which a sufficient light shielding property is compatible with a sufficient storage capacitance without reducing an aperture ratio. A lower light shielding film is formed on a substrate, a TFT is formed on the lower light shielding film, and an upper light shielding film is formed on the TFT via an interlayer insulating film to cover and fit the TFT. Thus, the TFT can be completely light-shielded by the lower light shielding film and the upper light shielding film and an occurrence of a photo leak current can be prevented.
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