Patent 7098145 was granted and assigned to Seiko Epson on August, 2006 by the United States Patent and Trademark Office.
A self-assembled monolayer (SAM) is fabricated using either a semi-fluorinated sulphur containing compound, or a sem-fluorinated silane derivative and compressed carbon dioxide (CO2) as the solvent medium. The temperature and/or pressure of the compressed CO2 may be varied during the fabrication process to improve the molecular packing density of the monolayer.