Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Stephen M. Rossnagel0
Cyril Cabral, Jr.0
Hyungjun Kim0
Steffen K. Kaldor0
Date of Patent
August 29, 2006
0Patent Application Number
107071170
Date Filed
November 21, 2003
0Patent Primary Examiner
Patent abstract
In an interconnect structure of an integrated circuit, a diffusion barrier film in a damascene structure is formed of a film having the composition TaNx, where x is greater than 1.2 and with a thickness of 0.5 to 5 nm.
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