Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
August 29, 2006
Patent Application Number
10755420
Date Filed
January 12, 2004
Patent Primary Examiner
Patent abstract
A system and method for measuring optical properties of films deposited or formed on semiconductor wafers. Measurements of an optical property are made in a plurality of non-overlapping locations within a test region of a film at a low radiation dose, and the measurements are averaged. The radiation dose is less than the actinic radiation sensitivity dose of the film, so that chemical changes in the film are not caused by the measurements. The measurements may be calibrated to prior art methods, and the results may be adjusted by the adjustment or calibration factor.
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