Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
September 12, 2006
0Patent Application Number
103414250
Date Filed
January 10, 2003
0Patent Primary Examiner
Patent abstract
A wafer cleaning method and system including a combined high frequency signal, a low frequency signal, and in one embodiment a biased voltage signal, allows cleaning particles and impurities off of fine-structured wafers, through application of an acoustic field to the wafer through a cleaning liquid which fosters micro-bubble formation for effective cleaning while buffering micro-bubble growth which would otherwise damage the wafer.
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