Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Yoshiaki Oku0
Korekazu Ueyama0
Norikazu Nishiyama0
Shunsuke Tanaka0
Date of Patent
September 12, 2006
0Patent Application Number
105067300
Date Filed
March 3, 2003
0Patent Primary Examiner
Patent abstract
It is an object to provide, with a high productivity, a dielectric thin film having a high degree of pore and a very great mechanical strength, and there are included a surfactant film forming step of forming a film including a surfactant on a surface of a substrate on which a thin film is to be formed, a vapor deposition step of causing the substrate to come in contact with a gas phase containing a silica derivative to form a thin film including the silica derivative, and a step of calcining the substrate having the thin film formed thereon and decomposing and removing the surfactant, the thin film being thus formed.
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