US Patent 7112270 Algorithm for real-time process control of electro-polishing
Patent 7112270 was granted and assigned to Applied Materials on September, 2006 by the United States Patent and Trademark Office.
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Patent abstract
Method and apparatus for process control of electro-processes. The method includes electro-processing a wafer by the application of two or more biases and determining an amount of charge removed as a result of each bias, separately. In one embodiment, an endpoint is determined for each bias when the amount of charge removed for a bias substantially equals a respective target charge calculated for the bias.
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US Patent 07112270 Algorithm for real-time process control of electro-polishing US Patent 7112270 Algorithm for real-time process control of electro-polishing
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Patent Number
0711227000
Patent Number
711227000
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Official Website
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
071122700
Date of Patent
September 26, 2006
0Patent Application Number
104568510
Date Filed
June 6, 2003
0Official Website
Patent Primary Examiner
Edits on 22 Sep, 2022
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
071122700
Date of Patent
September 26, 2006
0Patent Application Number
104568510
Date Filed
June 6, 2003
0Official Website
Patent Primary Examiner
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US Patent 07112270 Algorithm for real-time process control of electro-polishing
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07112270
Date of patent
September 26, 2006
Patent application number
10456851
Date Filed
June 6, 2003
Patent primary examiner
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