US Patent 7112616 Two-photon absorbing polymerizable composition and polymerization process thereof
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Patent Inventor Names
Hiroo Takizawa0
Masaharu Akiba0
Takeharu Tani0
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Patent abstract
A two-photon absorbing polymerizable composition contains at least a two-photon absorbing compound, a polymerization initiator and a polymerizable compound, the composition being photopolymerizable upon non-resonant two-photon absorption, wherein the two-photon absorbing compound is a methine dye containing a compound represented by the formula (1):
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US Patent 07112616 Two-photon absorbing polymerizable composition and polymerization process thereof US Patent 7112616 Two-photon absorbing polymerizable composition and polymerization process thereof
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Patent Number
07112616
Patent Number
7112616
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US Patent 07112616 Two-photon absorbing polymerizable composition and polymerization process thereof
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Is a
Patent jurisdiction
Patent number
07112616
Date of patent
September 26, 2006
Patent application number
10804144
Date Filed
March 19, 2004
Patent primary examiner
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