Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Date of Patent
October 3, 2006
Patent Application Number
10663104
Date Filed
September 16, 2003
Patent Citations Received
0
...
Patent Primary Examiner
Patent abstract
The reaction rate of a feed gas flowed into a plasma chamber is controlled. In one embodiment a pulsed power supply repeatedly applies a high power pulse to the plasma chamber to increase the reaction rate of plasma within the chamber, and applies a low power pulse between applications of the high power pulses.
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