US Patent 7116396 Exposure device, exposure method and device manufacturing method
Patent 7116396 was granted and assigned to Nikon (Somalia) on October, 2006 by the United States Patent and Trademark Office.
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Patent abstract
An exposure device, where circulating systems and for controlling a temperature varied by the driving of a linear motor are connected to a reticle stage and wafer stage, a controller sets the temperature of refrigerant circulating through the circulating system by driving heater, circulating system is connected to a projection optical system and a controller sets the temperature of refrigerant circulating through a circulating system by driving heater by a feedforward control to control the temperature of the refrigerant circulating through the circulating system.
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US Patent 07116396 Exposure device, exposure method and device manufacturing method US Patent 7116396 Exposure device, exposure method and device manufacturing method
Infobox
Patent Number
0711639600
Patent Number
711639600
Edits on 29 Mar, 2023
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
071163960
Date of Patent
October 3, 2006
0Patent Application Number
109447830
Date Filed
September 21, 2004
0Official Website
Patent Primary Examiner
Edits on 25 Sep, 2022
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
071163960
Date of Patent
October 3, 2006
0Patent Application Number
109447830
Date Filed
September 21, 2004
0Official Website
Patent Primary Examiner
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US Patent 07116396 Exposure device, exposure method and device manufacturing method
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07116396
Date of patent
October 3, 2006
Patent application number
10944783
Date Filed
September 21, 2004
Patent primary examiner
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