US Patent 7118832 Reflective mask with high inspection contrast

Patent 7118832 was granted and assigned to Intel on October, 2006 by the United States Patent and Trademark Office.

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Patent

Patent attributes

Current Assignee

Intel

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

7118832

Date of Patent

October 10, 2006

Patent Application Number

10339617

Date Filed

January 8, 2003

Patent Primary Examiner

‌

S. Rosasco

Patent abstract

A reflective mask may include an anti-reflective (AR) coating on an absorber layer to improve inspection contrast in an inspection system using deep ultraviolet (DUV) light. A silicon nitride (Si3N4) AR coating may be used on a chromium (Cr) or tantalum nitride (TaN) absorber layer.

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