Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Yasuhiko Matsunaga0
Fumitaka Arai0
Makoto Sakuma0
Riichiro Shirota0
Akira Shimizu0
Date of Patent
October 17, 2006
0Patent Application Number
111184780
Date Filed
May 2, 2005
0Patent Primary Examiner
Patent abstract
A floating gate is formed on a semiconductor substrate via a gate insulating film. Diffused layers are formed as sources or drain regions on opposite sides of the floating gate in the semiconductor substrate. First and second control gates are formed opposite to both of the diffused layers on the opposite sides of the floating gate via an inter-gate insulating film to drive the floating gate.
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