Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Yuji Harada0
Masayuki Endo0
Shinji Kishimura0
Yoshio Kawai0
Haruhiko Komoriya0
Jun Hatakeyama0
Kazuhiko Maeda0
Kazuhiro Yamanaka0
...
Date of Patent
October 24, 2006
Patent Application Number
10969097
Date Filed
October 21, 2004
Patent Primary Examiner
Patent abstract
A polymer comprising recurring units of formula (1) and recurring units of formulae (2a) to (2d) wherein R1 is F or fluoroalkyl, R2 is a single bond or an alkylene or fluoroalkylene, R3 and R4 are H, F, alkyl or fluoroalkyl, at least one of R3 and R4 contains F, R5 is H or an acid labile group, R6 is an acid labile group, adhesive group, alkyl or fluoroalkyl, and “a” is 1 or 2 is used as a base resin to formulate a resist composition which has advantages including high transparency to radiation having a wavelength of up to 200 nm, substrate adhesion, developer affinity and dry etching resistance.
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