Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
October 24, 2006
Patent Application Number
10191995
Date Filed
July 9, 2002
Patent Primary Examiner
Patent abstract
A photoresist layer is applied to the surface of a substrate. The photoresist layer is exposed and then developed, to form a structured polymer. A solution is then applied to the structured polymer that contains at least one organic electrically conductive compound. The structured polymer is converted into a conducting or semiconducting structured polymer.
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