Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
October 31, 2006
Patent Application Number
11124937
Date Filed
May 9, 2005
Patent Primary Examiner
Patent abstract
Photoresist polymers and photoresist compositions are disclosed. A photoresist polymer comprising a polymerization repeating unit represented by Formula 1 is less sensitive to change in the amount of energy due to its higher active energy than that of a conventional photoresist polymer. As a result, a phenomenon that a pattern of an outer field region that receives a relatively large amount of light becomes too thin is alleviated without additional dummy patterns when pattern is formed, and pattern collapse caused by a high aspect ratio due to high etching resistance is prevented.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
