Patent attributes
The present invention relates to an image sensor with a microlens and a method for fabricating the same with use of a bump formation process. A method for fabricating an image sensor includes the steps of: forming a passivation layer on a substrate structure provided with a photodiode and other various device elements; forming a microlens on a portion of the passivation layer; forming a microlens passivation layer for protecting the microlens from a subsequent bump formation process on the microlens; forming a pad open region by selectively etching the microlens passivation layer and the passivation layer; and forming a bump in the pad open region.