US Patent 7132218 Chemically amplified positive resist composition
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Patent Inventor Names
Kouji Toishi0
Satoshi Yamaguchi0
Yoshiyuki Takata0
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Patent abstract
The present invention provide a chemically amplified positive resist composition comprisinga resin which contains a structural unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution and becomes soluble in an alkali aqueous solution by the action of an acid;an acid generator; anda compound of the formula (C-1)
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US Patent 07132218 Chemically amplified positive resist composition US Patent 7132218 Chemically amplified positive resist composition
Infobox
Patent Number
071322180
Patent Number
71322180
Edits on 23 Sep, 2022
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Patent Jurisdiction
Patent Number
071322180
Date of Patent
November 7, 2006
0Patent Application Number
110828350
Date Filed
March 18, 2005
0Official Website
Patent Primary Examiner
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US Patent 07132218 Chemically amplified positive resist composition
Infobox
Is a
Patent jurisdiction
Patent number
07132218
Date of patent
November 7, 2006
Patent application number
11082835
Date Filed
March 18, 2005
Patent primary examiner
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