US Patent 7132367 Polishing method
Patent 7132367 was granted and assigned to Hitachi on November, 2006 by the United States Patent and Trademark Office.
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Patent abstract
A polishing technique wherein scratches, peeling, dishing and erosion are suppressed, a complex cleaning process and slurry supply/processing equipment are not required, and the cost of consumable items such as slurries and polishing pads is reduced A metal film formed on an insulating film comprising a groove is polished with a polishing solution containing an oxidizer and a substance which renders oxides water-soluble, but not containing a polishing abrasive.
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US Patent 07132367 Polishing method US Patent 7132367 Polishing method
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Patent Number
0713236700
Patent Number
713236700
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Official Website
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
071323670
Date of Patent
November 7, 2006
0Patent Application Number
104410630
Date Filed
May 20, 2003
0Official Website
Patent Primary Examiner
Edits on 23 Sep, 2022
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
071323670
Date of Patent
November 7, 2006
0Patent Application Number
104410630
Date Filed
May 20, 2003
0Official Website
Patent Primary Examiner
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US Patent 07132367 Polishing method
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07132367
Date of patent
November 7, 2006
Patent application number
10441063
Date Filed
May 20, 2003
Patent primary examiner
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