Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Christopher Schutte0
David A. Stark0
Date of Patent
November 14, 2006
0Patent Application Number
106966230
Date Filed
October 29, 2003
0Patent Citations Received
Patent Primary Examiner
Patent abstract
According to one embodiment of the invention, a chemical mechanical polishing system includes a platen having a first surface adapted to couple a polishing pad thereto. The first surface includes a generally circular center portion and an annular portion surrounding the generally circular center portion. The generally circular center portion encloses an area and has an attachment surface area that is less than the area enclosed by the generally circular center portion. The attachment surface area is adapted to couple an inner portion of the polishing pad to the platen.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
