Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
November 14, 2006
Patent Application Number
10394024
Date Filed
March 24, 2003
Patent Primary Examiner
Patent abstract
By removing halogen atoms existing on the surface of the silicon layer and in the subsurface thereof so that the concentration of halogen atoms becomes 100 ppm or lower and forming an electrode on the resulting silicon layer, the electrode which has a low resistance can be produced, and a highly reliable semiconductor device can be produces as well.
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