Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
November 14, 2006
Patent Application Number
10469506
Date Filed
March 4, 2002
Patent Primary Examiner
Patent abstract
Upon performing a heat treatment by heating a semiconductor wafer positioned inside a reaction vessel with a heater provided outside the reaction vessel and supplying a processing gas into the reaction vessel, to increase the temperature inside the reaction vessel promptly to reach a processing temperature to be stabilized after the wafer is carried into the reaction vessel, and to reduce the burden to the operator caused in the heating control adjustment.
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