Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Kazuyoshi Mizutani0
Shinichi Kanna0
Toshiaki Aoai0
Date of Patent
November 21, 2006
0Patent Application Number
100999810
Date Filed
March 19, 2002
0Patent Primary Examiner
Patent abstract
A positive resist composition comprises: (A) a resin capable of decomposing by the action of an acid to increase the solubility in an alkali developer; and (B) a compound capable of generating an acid upon irradiation with one of an actinic ray and a radiation, wherein the resin (A) contains a specified repeating unit.
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