Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
November 28, 2006
Patent Application Number
10849186
Date Filed
May 20, 2004
Patent Primary Examiner
Patent abstract
Resist compositions comprising basic compounds having an imidazole skeleton and a polar functional group have an excellent resolution and an excellent focus margin and are useful in microfabrication using electron beams or deep-UV light.
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