US Patent 7144675 Radiation-sensitive resin composition
Patent 7144675 was granted and assigned to JSR Corporation on December, 2006 by the United States Patent and Trademark Office.
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Patent abstract
A radiation-sensitive resin composition comprising (A) a resin comprising at least two recurring units of the formulas (1)–(6) in the total amount of 5–70 mol %, but each in the amount of 1–49 mol %, the resin being insoluble or scarcely soluble in alkali, but becoming easily soluble in alkali by the action of an acid, and (B) a photoacid generator.
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US Patent 07144675 Radiation-sensitive resin composition US Patent 7144675 Radiation-sensitive resin composition
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Patent Number
0714467500
Patent Number
714467500
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Official Website
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
071446750
Date of Patent
December 5, 2006
0Patent Application Number
106482430
Date Filed
August 27, 2003
0Official Website
Patent Primary Examiner
Edits on 24 Sep, 2022
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
071446750
Date of Patent
December 5, 2006
0Patent Application Number
106482430
Date Filed
August 27, 2003
0Official Website
Patent Primary Examiner
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US Patent 07144675 Radiation-sensitive resin composition
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07144675
Date of patent
December 5, 2006
Patent application number
10648243
Date Filed
August 27, 2003
Patent primary examiner
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