Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Akio Misaka0
Date of Patent
December 5, 2006
0Patent Application Number
113123490
Date Filed
December 21, 2005
0Patent Primary Examiner
Patent abstract
A photomask includes a semi-light-shielding portion having a light-shielding property, a light-transmitting portion surrounded by the semi-light-shielding portion and a peripheral portion positioned in a periphery of the light-transmitting portion on a transparent substrate. The semi-light-shielding portion and the light-transmitting portion transmit the exposure light in the same phase each other, whereas the peripheral portion transmits the exposure light in a phase opposite to that of the light-transmitting portion. A phase shift film that transmits the exposure light in a phase opposite to that of the peripheral portion is formed on the transparent substrate in the semi-light-shielding portion formation region.
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