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US Patent 7144700 Photolithographic solid-phase polymer synthesis

Patent 7144700 was granted and assigned to Affymetrix on December, 2006 by the United States Patent and Trademark Office.

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Patent
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Current Assignee
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Affymetrix
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
71447000
Patent Inventor Names
Jacqueline A. Fidanza0
Brian M. Feldman0
Daniel E. Falvey0
Glenn McGall0
Date of Patent
December 5, 2006
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Patent Application Number
096207800
Date Filed
July 21, 2000
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Patent Primary Examiner
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Peter Paras, Jr.
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Patent abstract

Methods, employing a polycyclic hydrocarbon or a polycyclic heteroaromatic compound as sensitizers, are provided to increase the efficiency of removing, by irradiation, photolabile protecting groups that mask reactive sites on synthesis intermediaries. Preferred groups of photolabile protecting moieties include: ((α-methyl-2-nitropiperonyl)-oxy)carbonyl (MeNPOC), ((Phenacyl)-oxy)carbonyl (PAOC), O-(9-phenylxanthen-9-yl) (PIXYL), and ((2-methylene-9,10-anthraquinone)-oxy)carbonyl (MAQOC). In conjunction with using the sensitizers and protecting groups described above, a method of forming, from component molecules, a plurality of compounds on a support, each compound occupying a separate predefined region of the support is provided. These resulting solid-phase arrays are useful, for example, to assay for the presence of biochemical products in biological samples.

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