US Patent 7147747 Plasma processing apparatus and plasma processing method
Patent 7147747 was granted and assigned to Hitachi on December, 2006 by the United States Patent and Trademark Office.
Is a
Current Assignee
Date Filed
March 4, 2003
Date of Patent
December 12, 2006
Patent Application Number
10377826
Patent Jurisdiction
Patent Number
Patent Primary Examiner
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