Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Martijn Houkes0
Martinus Agnes Willem Cuijpers0
Menno Fien0
Edwin Teunis Van Donkelaar0
Evert Hendrik Jan Draaijer0
Marcus Joseph Elisabeth Godfried Breukers0
Date of Patent
December 12, 2006
0Patent Application Number
108806050
Date Filed
July 1, 2004
0Patent Primary Examiner
Patent abstract
A lithographic apparatus that includes an exposure system and a measurement system, is presented. The exposure system projects a patterned beam onto a target portion of a first substrate, while the measurement system projects a measurement beam on a target portion of a second substrate. Movement of a movable part of the apparatus generates a disturbance in a position of another movable part of the apparatus, e.g. due to displacement of air. This error can be compensated by calculating a compensation signal which is a function of states of one or both of the movable parts.
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