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US Patent 7153631 Pattern-forming process using photosensitive resin composition

Patent 7153631 was granted and assigned to Hitachi on December, 2006 by the United States Patent and Trademark Office.

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edited on 31 Aug, 2023
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Patent abstract

There are disclosed a photosensitive resin composition which comprises(A) a polyamic acid having recurring units represented by the formula (I):

Edits on 31 Jul, 2023
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edited on 31 Jul, 2023
Infobox
Is a
Patent
Patent
0
Current Assignee
Hitachi
Hitachi
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
0
Patent Number
71536310
Date of Patent
December 26, 2006
0
Patent Application Number
107130360
Date Filed
November 17, 2003
0
Patent Primary Examiner
‌
John S. Chu
0
Edits on 22 Jul, 2023
"Remove website redirecting to Patent Public Search front page"
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Golden AI
edited on 22 Jul, 2023
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Infobox (-1 properties)
Infobox
Official Website
https://pdfpiw.uspto.gov/.piw?Docid=0715363100
Edits on 15 Jul, 2023
"Remove leading 0 from patent number"
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edited on 15 Jul, 2023
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US Patent 07153631 Pattern-forming process using photosensitive resin composition US Patent 7153631 Pattern-forming process using photosensitive resin composition

Infobox
Patent Number
0715363100
Patent Number
715363100
Edits on 30 Mar, 2023
"Entity importer update"
Golden AI profile picture
Golden AI
edited on 30 Mar, 2023
Infobox
Is a
Patent
Patent
0
Current Assignee
Hitachi
Hitachi
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
0
Patent Number
071536310
Date of Patent
December 26, 2006
0
Patent Application Number
107130360
Date Filed
November 17, 2003
0
Official Website
https://pdfpiw.uspto.gov/.piw?Docid=071536310
Patent Primary Examiner
‌
John S. Chu
0
Edits on 22 Sep, 2022
"Entity importer update"
Golden AI profile picture
Golden AI
edited on 22 Sep, 2022
Infobox
Is a
Patent
Patent
0
Current Assignee
Hitachi
Hitachi
0
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
0
Patent Number
071536310
Date of Patent
December 26, 2006
0
Patent Application Number
107130360
Date Filed
November 17, 2003
0
Official Website
https://pdfpiw.uspto.gov/.piw?Docid=071536310
Patent Primary Examiner
‌
John S. Chu
0
Edits on 8 Jun, 2022
"Entity importer update"
Golden AI profile picture
Golden AI
edited on 8 Jun, 2022
Edits made to:
Infobox (+1 properties)
Infobox
Website URL
https://pdfpiw.uspto.gov/.piw?Docid=07153631
Edits on 19 Nov, 2021
"Created via: Entity Importer"
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Golden AI
created this topic on 19 Nov, 2021
Edits made to:
Infobox (+8 properties)
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 US Patent 07153631 Pattern-forming process using photosensitive resin composition

Infobox
Is a
Patent
Patent
Current assignee
Hitachi
Hitachi
Patent jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent number
07153631
Date of patent
December 26, 2006
Patent application number
10713036
Date Filed
November 17, 2003
Patent primary examiner
‌
John S. Chu

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