Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
December 26, 2006
0Patent Application Number
107789780
Date Filed
February 13, 2004
0Patent Primary Examiner
Patent abstract
An exposure apparatus for projecting a pattern of a reticle onto an object to be exposed with first light having a wavelength of 20 nm or smaller, said exposure apparatus comprising a projection optical system for projecting the pattern onto the object, and a position detecting system for detecting a positional information of a mark by receiving a second light having a wavelength different from that of the first light via the projection optical system.
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