US Patent 7163832 Method for manufacturing CMOS image sensor
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Patent abstract
The present invention discloses a method for manufacturing an image sensor which makes the boundaries between microlenses clear by forming a guide layer in advance and can increase the focal distance of light and the quantity of light by forming the spheres of the microlenses to have a constant height.
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US Patent 07163832 Method for manufacturing CMOS image sensor US Patent 7163832 Method for manufacturing CMOS image sensor
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Patent Number
0716383200
Patent Number
716383200
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Patent Jurisdiction
Patent Number
071638320
Date of Patent
January 16, 2007
0Patent Application Number
109839900
Date Filed
November 8, 2004
0Official Website
Patent Primary Examiner
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Infobox
Is a
Patent Jurisdiction
Patent Number
071638320
Date of Patent
January 16, 2007
0Patent Application Number
109839900
Date Filed
November 8, 2004
0Official Website
Patent Primary Examiner
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US Patent 07163832 Method for manufacturing CMOS image sensor
Infobox
Is a
Patent jurisdiction
Patent number
07163832
Date of patent
January 16, 2007
Patent application number
10983990
Date Filed
November 8, 2004
Patent primary examiner
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