Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Eric J. Strang0
Wayne L. Johnson0
Date of Patent
January 23, 2007
0Patent Application Number
100760990
Date Filed
February 15, 2002
0Patent Citations Received
0
0
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Patent Primary Examiner
Patent abstract
In a method for performing a plasma-assisted treatment on a substrate in a reactor chamber by: introducing at least one process gas into the reactor chamber; and creating a plasma within the reactor chamber by establishing an RF electromagnetic field within the chamber and allowing the field to interact with the process gas, the electromagnetic field is controlled to have an energy level which varies cyclically between at least two values each sufficient to maintain the plasma, such that each energy level value is associated with performance of a respectively different treatment process on the substrate.
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