Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
January 30, 2007
Patent Application Number
10844317
Date Filed
May 13, 2004
Patent Primary Examiner
Patent abstract
A method is suitable for cleaning substrates, after polishing, that require a high degree of cleanliness, such as semiconductor wafers, glass substrates, or liquid crystal displays. The method includes polishing a substrate using an abrasive liquid containing abrasive particles, and cleaning a polished surface of the substrate by supplying a cleaning liquid having substantially the same pH as the abrasive liquid or similar pH to the abrasive liquid so that a pH of the abrasive liquid attached to the polished surface of the substrate is not rapidly changed.
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