Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Antonius Theodorus Anna Maria Derksen0
Date of Patent
January 30, 2007
0Patent Application Number
109903170
Date Filed
November 17, 2004
0Patent Primary Examiner
Patent abstract
In a maskless lithography apparatus light deflected by a patterning array out of a path towards a substrate is directed onto a detector that detects malfunctions of the patterning array. If the patterning array is of a type which selectively diverts radiation in order to pattern the beam, the detector can use the radiation that is diverted out of the beam. Alternatively, a second beam of radiation, additional to the exposure radiation, can be provided.
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