US Patent 7179335 In situ adaptive masks
Patent 7179335 was granted and assigned to Finisar on February, 2007 by the United States Patent and Trademark Office.
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A variable adaptive mask is provided that can be dynamically modified in situ in a physical vapor deposition process. The mask comprises a fixed mask portion, a plurality of channels extending through the fixed mask portion, a control mechanism for controlling throughput of a vaporized target material through the channels, and a mechanism to mount the mask in a fixed position relative to a solid target material and a substrate. In one embodiment, a magnetic control mechanism is provided to control throughput of the vaporized target material through the channels. In another embodiment, a thermal control mechanism is provided to control throughput of a vaporized target material through the channels. Methods of controlling a physical vapor deposition process using the adaptive mask are also disclosed.
US Patent 07179335 In situ adaptive masks US Patent 7179335 In situ adaptive masks
US Patent 07179335 In situ adaptive masks
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