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Patent attributes
Current Assignee
0
Patent Jurisdiction
Patent Number
Patent Inventor Names
Sidlgata V. Sreenivasan0
Date of Patent
February 20, 2007
0Patent Application Number
103966150
Date Filed
March 25, 2003
0Patent Primary Examiner
Patent abstract
The present invention provides a method to pattern a substrate which features creating a multi-layered structure by forming, on the substrate, a patterned layer having protrusions and recessions. Formed upon the patterned layer is a conformal layer, with the multi-layered structure having a crown surface facing away from the substrate. Portions of the multi-layered structure are removed to expose regions of the substrate in superimposition with the protrusions, while forming a hard mask in areas of the crown surface in superimposition with the recessions.
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