Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
March 6, 2007
Patent Application Number
10615228
Date Filed
July 9, 2003
Patent Primary Examiner
Patent abstract
An inspection method, includes obtaining a first optical characteristic of a projection optical system by transferring an image of an aberration measurement unit of a photomask on a first resist film coated on a first wafer by use of a first polarized exposure light; obtaining a second optical characteristic of the projection optical system by transferring the image of the aberration measurement unit on a second resist film coated on a second wafer by use of a second exposure light having a polarization state different from the first exposure light; and calculating a difference between the first and second optical characteristics.
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